Think & Tinker, Ltd.
P.O. Box 1606, Palmer Lake, CO 80133
Tel: (719) 488-9640, Fax: (866) 453-8473
Sales: Sales@ThinkTink.com, Support: Support@ThinkTink.com
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Photopolymer Dry-film Developing Module
Operation/Developing photoresist and soldermask II

  1. Using an eye loupe, if available, carefully inspect the developed pattern to insure that all edges are sharp and steep, that any partially dissolved material has been removed, and that all tented holes are still securely covered.

    Properly exposed and developed photopolymers, besides being fairly tough, display very distinct characteristics which are visible even under a very modest power (10X) magnifier. All trace walls should be nearly vertical and should meet the surface of the copperclad in sharp, well defined intersections. The photopolymer surface should be smooth and glossy (after drying) and should meet the trace walls along sharp (or very slightly rounded) edges. (fig. 6).
  2. If the board needs more developing, return it to the tank and agitate for another minute (flipping at 30 seconds).
  3. Rinse (and scrub) the board and re-inspect.
  4. Continue in this manner until the image is developed to your satisfaction.
  5. Thoroughly rinse the board with warm tap water, blow dry, and place in a 212°F (100°C) oven for 5 minutes. Do not leave the board in the oven for more than 10 minutes or it may become VERY brittle and difficult to strip.
  6. Remove the board from the oven and allow it to cool to room temperature.
  7. The developed board is now ready for further processing.

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Established 1990

On the web since 1994

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Copyright © 1994 - 2014 Think & Tinker, Ltd. Updated 2/13/2014 7:36:56 AM